SDI’s COCOS and Mobile Charge technologies utilize full wafer corona charge deposition to control the dielectric field, and provide non-contact, real-time replacement of traditional MOS C-V testing for production tool monitoring. The patented mobile charge measurement allows full wafer mapping – essential for contamination control, with quantitative determination of Na and Cu concentrations.

FAaST tools with COCOS and Mobile Charge technologies provide:    
- fully automated, non-contact COCOS C-V measurements, including automatic extraction of dielectric capacitance, thickness, flatband voltage, interface trap density, and total oxide charge.- Full wafer mapping of mobile Na contamination in oxide, using SDI's patented oxide voltage shift technique (- 6000 point maps in ~12 minutes)
- Full wafer mapping of mobile Cu contamination in oxide (SDI patent)
- Fully automated operation, with multiple security levels designed for the manufacturing environment.
- Options such as SMIF / FOUP loadports, automatic lot ID, wafer OCR, and fully SEMI compliant automation for data upload and remote system control.
- Automatic internal calibration

All functions are available in tools up to 200mm, or 200mm to 300mm, with measurements of multiple wafer sizes possible with a simple mouse click. Tools can also be configured to include SPV and near surface doping technologies within the standard footprint.

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